SIMS Application of IC Failure Analysis
- Practical Electron Microscopy and Database - - An Online Book - |
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Microanalysis | EM Book https://www.globalsino.com/EM/ | ||||||||
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Figure 1251 shows SIMS profiles of failed and good MOS structures. The root cause of the device failure is due to gate oxide breakdown, induced by Cu (copper) contamination.
[1] Kin Man Yu, https://www6.cityu.edu.hk.
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