Electron microscopy
 
TEM Lattice Fringe Affected by FIB Damage
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Figure 1310 shows HAADF lattice images of Si crystalline specimens prepared with 40 kV and 2 kV Ga+ Polishing. It is clear that the 40 kV milling caused more damage.

TEM Lattice Fringe Affected by FIB Damage
TEM Lattice Fringe Affected by FIB Damage
(a)
(b)
Figure 1310. HAADF lattice images of Si crystalline specimens: (a) 40 kV and (b) 2 kV Ga+ Polishing.

 

 

 

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