TEM Lattice Fringe Affected by FIB Damage - Practical Electron Microscopy and Database - - An Online Book - |
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Microanalysis | EM Book https://www.globalsino.com/EM/ | ||||||||
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Figure 1310 shows HAADF lattice images of Si crystalline specimens prepared with 40 kV and 2 kV Ga+ Polishing. It is clear that the 40 kV milling caused more damage.
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