Problems Limiting Applications of Titanium Silicides into Si Devices
- Practical Electron Microscopy and Database -
- An Online Book -

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This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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Two significant problems limit the application of titanium silicides (TiSi2) into Si devices: the C49-C54 phase transition temperature and the agglomeration of the silicide during the annealing processes.

 

 

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