Problems Limiting Applications of Titanium Silicides into Si Devices
- Practical Electron Microscopy and Database -
- An Online Book -

https://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

=================================================================================

Two significant problems limit the application of titanium silicides (TiSi2) into Si devices: the C49-C54 phase transition temperature and the agglomeration of the silicide during the annealing processes.

 

 

=================================================================================

The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. You can click How to Cite This Book to cite this book. If you let Yougui Liao know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.



 
 
 
Copyright (C) 2006 GlobalSino, All Rights Reserved