This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
TiSix is a more general form of titanium silicide materials. Ti5Si3 is a material suitable for high temperature applications [1, 2]. It has combined properties of a high melting point (2403 K), a low density (4.32 g/cm3), high hardness (11.3 GPa), and a relatively high Young’s modulus (225 GPa) .
Ti5Si3 has complex hexagonal structure (D88) with lattice parameters of a = 0.514 nm and c = 0.744 nm, and has 16 atoms per unit cell.
Under some conditions, prior to the disilicide formation [3-5], the initial crystalline phase formed during the Ti–Si interaction is a metal-rich silicide (either Ti5Si3 or Ti5Si4). Then, the disilicides form at the expense of the metal-rich silicide at higher annealing temperature.
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