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CMP Scratches - Practical Electron Microscopy and Database - - An Online Book - |
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| Microanalysis | EM Book https://www.globalsino.com/EM/ | ||||||||
| This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers. | ||||||||
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Node-to-node and node-to-power line shorting in memories can occur through CMP scratches [1]. This type of shorting is normally on the order of a tenth of a micron or larger.
[1] Soon-Moon Jung, Jun-Sup Uom, Won-Suek Cho, Yong-Joon Bae, Yeon-Kyu Chung, Kwang-Suk Yu, Kil-Yeon Kim, Kyung-Tae Kim, A study of formation and failure mechanism of CMP scratch induced defects on ILD in a W-damascene interconnect SRAM cell, in: Proceedings of the 39th Annual International Reliability Physics Symposium, Orlando, FL, 2001, p. 42.
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| The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page. | ||||||||
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