Overlay Measurement in Integrated Circuits (IC)
- Practical Electron Microscopy and Database -
- An Online Book -

http://www.globalsino.com/EM/  



 

This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.

 

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The convex and trench structures and groove edges generate brighter signals in the topographic contrasts. For instance, microelectronics industry uses the topographic contrast to perform the detection of the strip width, side wall, profile analysis, critical-dimension (CD), overlay measurement, etc.

 

 

 

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The book author (Dr. Liao) welcomes your comments, suggestions, and corrections, please click here for submission. You can click How to Cite This Book to cite this book. If you let Dr. Liao know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page. This appearance can help advertise your publication.



 
 
 
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