This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers. How to Cite This Book

=================================================================================

One method to evaluate the sputtering cross section is to measure the hole formation in the TEM film [1]. The surface of the TEM sample also becomes rough due to electron induced sputtering. However, if surface diffusion is rapid compared to the sputtering rate, the sample surface could maintain smooth, resulting in inaccurate evaluation of sputtering cross section.

[1] D. Cherns, M. W. Finnis, M. D. Matthews, Phil. Mag. 35 (1977) 693.