Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
Since the first 200 and 300 kV FEGTEMs (field emission gun TEMs) had been sold by JEOL and Philips, the sales of FEGTEMs were rising steadily. The acceptance specifications of new Transmission Electron Microscopy (TEM) systems typically include a set of performance metrics and operational criteria that must be met before the equipment is considered suitable for analytical or research applications. Key specifications often include image resolution, which ensures that the TEM can accurately resolve features down to sub-nanometer scales, and electron gun stability, which affects the consistency and reliability of the electron beam for extended imaging sessions. Additional acceptance criteria may involve stage accuracy and precision, ensuring reproducible positioning and movement of samples under varying conditions. Image contrast and signal-to-noise ratio are also crucial, as these determine the quality and interpretability of the images produced. Furthermore, the TEM system is often evaluated for its ability to handle different modes of imaging (e.g., bright-field, dark-field, high-resolution TEM, and scanning TEM) to support adaptable analytical applications. Acceptance tests may also include energy resolution for Electron Energy Loss Spectroscopy (EELS) and X-ray analysis capabilities for compositional information, validating that the system meets the intended operational standards for comprehensive material characterization. Table 0006 lists a reference of acceptance specifications of new TEM systems. Table 0006. Reference of acceptance specifications of new TEM systems.
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