Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Chlorine contamination can induce corrosion in semiconductor fabs. The contamination sources are some Cl-based gases such as Cl2, HCl and BCl3, or chemicals used in fabrication flows or chemicals in the fabrication environment. Chlorine reacts with some elements immediately and forms the corrosive products. For instance, it is very common that chlorine reacts with Al element by, Al3+ + 3Cl- = AlCl3 ----------------- [2044] The AlCl3 is water soluble products.Table 2044. Chlorine contamination in IC devices.
|