Practical Electron Microscopy and Database

Table 2424 lists the peak positions of F 1s XPS of fluorine-related molecules/materials.

Table 2424. The peak positions of F 1s XPS of fluorine-related molecules/materials.

[1] R. Morrish, A. Witvrouw, and A. J. Muscat, “Kinetic to transport-limited anhydrous HF etching of silicon oxynitride films in supercritical CO2,” J. Phys. Chem. C, vol. 111, no. 42, pp. 15251–15257, Jul. 2007.
[2] E. T. P. Benny and J. Majhi, “An X-ray photoelectron study of the dependence of HF concentration on an etched silicon surface,” J. Electron Spectrosc. Relat. Phenom., vol. 58, no. 4, pp. 261–270, Jun. 1992.
[3] C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Mullenberg, Handbook of X-Ray Photoelectron Spectroscopy: A Reference Book of Standard Data for Use in X-Ray Photoelectron Spectroscopy. Eden Prairie, MN, USA: Perkin-Elmer, 1979, p. 44 and 52.