Practical Electron Microscopy and Database

An Online Book, Second Edition by Dr. Yougui Liao (2006)

Practical Electron Microscopy and Database - An Online Book

Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix

Laser-Based Pulsed Electron Beam Generation for EMs

In the method of laser-based pulsed electron beam generation for EMs, a photocathode replaces the traditional FEG. The generation of pulsed electron beams relies on the interaction between a short-duration laser pulse and a photocathode. That is, the laser-based photocathode method directly generates pulsed electron beams by using laser pulses to release electrons from a photocathode via the photoelectric effect. The laser-based pulsed electron beam generation method is primarily used in ultrafast electron microscopy (UEM). When the laser strikes the photocathode, electrons are emitted via the photoelectric effect. The energy from the laser photons excites electrons in the material, allowing them to overcome the work function of the photocathode and be ejected as free electrons. The duration of the laser pulse, typically in the femtosecond range, defines the timing of electron emission, resulting in the generation of electron packets rather than a continuous beam. By adjusting the repetition rate of the laser, the temporal spacing between these electron packets can be precisely controlled, providing high temporal resolution and allowing for the study of ultrafast dynamics. This method offers a distinct advantage over conventional continuous emission from field emission guns, as it enables a controlled and tunable pulsed electron beam, reducing specimen damage and enhancing temporal resolution in applications such as UEM. 

Figure 2637 shows the overview of the fs laser-based approach of pulsed-beam generation in TEM.

fs laser-based approach of pulsed-beam generation in TEM

Figure 2637. fs laser-based approach of pulsed-beam generation in TEM: (a) A photograph of the FEI Tecnai Femto ultrafast electron microscope (UEM). The base microscope is a Tecnai G2 T20 operating at 200 kV with a LaB6 thermionic electron gun. The red circles highlight the optical periscopes responsible for (1) generating photoelectrons and (2) exciting the specimen with laser light (though periscope 2 is not relevant to pulsed-beam damage reduction). (b) A simplified cross-section of the electron gun, illustrating the photogeneration of precisely timed electron packets. (c) A conceptual comparison between the laser-controlled, single-electron emission and conventional thermionic low-dose emission, where in the laser-based method, the probability of emission [P(t)] is restricted to the duration of the laser pulse (e.g., 300 femtoseconds, full width at half maximum). (d) The equation for the average photoemission beam current. [1, 2]

This technique enables time-resolved studies of dynamic processes at the atomic and molecular levels. By generating electron pulses in the femtosecond range, UEM allows researchers to capture ultrafast events, such as atomic motion, phase transitions, or reaction mechanisms, that occur on extremely short timescales:

  • Materials science: Investigating structural dynamics and changes in materials at atomic resolution.
  • Chemistry: Observing real-time chemical reactions and transformations.
  • Biology: Studying fast biological processes such as protein dynamics.
  • Physics: Examining ultrafast electronic, vibrational, or optical excitations in solid-state systems.
 

 

 

 

 

 

 

 

 

 

 

[1] David J. Flannigan, Elisah J. VandenBussche, Pulsed-beam transmission electron microscopy and radiation damage, Micron, 172, 103501, 2023.
[2] VandenBussche, E. J.; Flannigan, D. J. Reducing Radiation Damage in Soft Matter with Femtosecond- Timed Single-Electron Packets. Nano Lett. 19, 6687-6694. 10.1021/acs.nanolett.9b03074, 2019.