This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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OBIRCH is basically a DC-method, which sometimes limits the investigation of dynamically functional devices due to their time-dependent device function. For instance, Figure 2843 shows diagonal stripes, in an OBIRCH pattern, induced by the interference between laser scanning and internal device operation frequency. Those stripes were originated from overlapping of systematic current signals caused by dynamic current consumption. The vertical top-bottom tails in the rectangular box were originated from intermetal vias at high current density, giving strong, but not defect-related OBIRCH signals.

[1] Peter Jacob and Félix Beaudoin, OBIRCH – Monitoring As A Reliability-Failure-Analysis and Screening Tool, ISTFA proceedings 2001 (ASM International), pp. 397-403.