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FIB Lithography - Practical Electron Microscopy and Database - - An Online Book - |
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| Microanalysis | EM Book https://www.globalsino.com/EM/ | ||||||||
| This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers. | ||||||||
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FIB lithography is similar to electron beam lithography (EBL), but provides more capabilities. For EBL, the major factor limiting the reduction of feature sizes in integrated circuits (ICs) is the so-called proximity effect due to backscattered electrons. However, this effect does not exist in FIB lithography.
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| The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page. | ||||||||
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