Electron microscopy
 
Electron-probe Intensity Distribution Depending on Aberrations
- Practical Electron Microscopy and Database -
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Figure 3337 shows the simulated intensity distribution patterns of 200 keV-electron probes at 100 nm of B2 (second-order axial coma), 100 nm of A2 (three-fold axial astigmatism), 1 µm of S3 (axial star aberration of the 3rd order), and 2 µm of A3 (four-fold axial astigmatism).

intensity distribution patterns of 200 keV-electron probes

Figure 3337. Simulated intensity distribution patterns of 200 keV-electron probes: (a) B2 = 100 nm, (b) A2 = 100 nm, (c) S3 = 1 µm, and (d) A3 = 2 µm. In this simulation, the defocus C1 was set to -3 nm, the imaginary parts of the aberrations to zero, and the illumination semi-angle to 30 mrad. [1]

 

 

 

[1] Simulation of Rolf Erni.

 

 

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