Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Secondary ion mass spectrometry (SIMS) uses various ions for sputtering of sample surfaces. In SIMS, a primary beam of ions with energies typically between 10 and 20 keV is generated, accelerated and focused onto the surface of a target.
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