|
|
Topographic Contrast (Sharpness) Depending on
the Accelerating Energy of Electron Beam
- Practical Electron Microscopy and Database -
- An Online Book -
|
|
https://www.globalsino.com/EM/
|
|
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
|
=================================================================================
The SEM contrast strongly depends on the surface topography and the feature of the specimen. As proposed by Joy & Joy [1], a decrease in the beam energy increases the sharpness of the images governed by topographic contrast. Figures 4576a (a) and (b) show the edge effects at primary beam energies of 5 keV and 15 keV, respectively. It is clear that the sharpness of the topography at 5 keV is higher than that at 15 keV. Figure 4576a (c) indicates the volume of secondary electron generation at different beam energies, causing the sharpness difference.
Figure 4576a. (a) and (b) showing the edge effects at primary beam energies of 5 keV and 15 keV,
respectively; (c) indicating the origin of sharpness difference related to beam energies. δ is the total generation of secondary electrons. Adapted from [2]. [1] Joy, D.C. & Joy, C.S. (1996) Low voltage scanning electron microscopy.
Micron 27, 247–263.
[2] J. Cazaux, (2005) Recent developments and new strategies in scanning electron microscopy, Journal of Microscopy, 217, 16–35.
|
=================================================================================
The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.
|
|
