Chapter/Index: Introduction | A |
B |
C |
D |
E |
F |
G |
H |
I |
J |
K |
L |
M |
N |
O |
P |
Q |
R |
S |
T |
U |
V |
W |
X |
Y |
Z |
Appendix
Pulsed Electron Beam in Electron Microscopy
Table 692 lists some common examples of generations and applications of pulsed electron beams in electron microscopy.
Table 692. Generations and applications of pulsed electron beams in electron microscopy.
EM |
Pulse Width |
Interval between Two Pulses / Frequency |
Pulse Mechanism |
Application |
Reference |
TEM |
2 ps or 14 ps |
12.5 ns / 80 MHz |
RF-cavity chopped-beam (see page677) |
Mitigate specimen radiation damage |
[1] |
2 ps or 14 ps |
(152 ps or 165 ps) / ~6 GHz |
TEM |
300 fs |
100 μs / 10 kHz |
Pulsed electron beam generation based on laser-based photoelectron emission (see page2637) |
Time-resolved studies of dynamic processes at the atomic and molecular levels. |
[1] |
5 μs / 200 kHz |
<100 fs / 10 THz |
[2] |
EM |
ns to µs |
|
Electrostatic beam deflection (beam blanking) (see page2464) |
|
|
EM |
ns |
|
Field emission with modulated voltage (see page704) |
|
|
Electron beam lithography and EM |
10 ps to 100 ns |
|
Microwave and pulsed RF-based guns (see page510) |
|
|
[1] David J. Flannigan, Elisah J. VandenBussche, Pulsed-beam transmission electron microscopy and radiation damage, Micron, 172, 103501, 2023.
[2] Vladimir A. Lobastov, Ramesh Srinivasan, and Ahmed H. Zewail, Four-dimensional ultrafast electron microscopy, 102 (20) 7069-7073, 2005.
|