Electron microscopy
  
Spatial Filter for Wafer Map Analysis
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Spatial filter can be used for identification of global defects and local defects in defect denoising. Note if multiple local defect clusters have different defect densities, this Nearest-Neighbor (NN) clutter removal denoising approach (see page4255) may not perform well, and we found that the spatial filter [1] may perform better.

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[1] C. H. Wang, W. Kuo, and H. Bensmial, “Detection and classification of defects patterns on semiconductor wafers,” IIE Trans., vol. 39, no. 12, pp. 1059–1069, 2006.






























 

 

 

 

 
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