Electron microscopy
 
Front End of Line (FEOL)
- Integrated Circuits and Materials -
- An Online Book -
Integrated Circuits and Materials                                                                                  http://www.globalsino.com/ICsAndMaterials/        


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Figure 2356a. BEOL (copper interconnect layers) and FEOL (transistor level). In the IC (integrated circuits) process, transistors are manufactured on a wafer in a fab, where the front-end-of-the-line (FEOL) is. And then, the interconnects and MOL (middle-of-line) layers are produced in a separate fab facility called the backend-of-the-line (BEOL). The transistor structure and interconnects are the MOL, which consists of a series of tiny contact structures.

BEOL and FEOL

Figure 2356a. BEOL and FEOL. [1]

BEOL and FEOL

Figure 2356b. BEOL and FEOL. [2]

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[1] https://semiengineering.com/breaking-the-2nm-barrier/.
[2] Chun-Jen Weng, Feasible approach for processes integration of CMOS transistor gate/side-wall spacer patterning fabrication, Microelectronics Reliability 50 (2010) 1951–1960.

 

 

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