- Practical Electron Microscopy and Database -
- An Online Book -  

This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


The people now believe that the scaling limit to Moore’s law is lithography because of the need for shorter wavelengths of light to pattern the smaller feature sizes. Therefore, materials are now a key constraint in silicon technology. For example, the current density of conductors in ICs can be increased by using copper instead of aluminium. The RC time delays can be minimized using materials with lower dielectric constants instead of  SiO2. Leakage in MOS structures can be minimized using materials, with high dielectric constants, between the gate and the silicon channel in FET in stead of SiO2.




The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. You can click How to Cite This Book to cite this book. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.

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