EELS Background versus Edge Onset
- Practical Electron Microscopy and Database -
- An Online Book -

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This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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In the cases that very thick TEM samples are used in EELS or EFTEM measurements, the increase of plural scattering effects induces two main problems:
         i) The background models, e.g. the form of power law, are not convenient to represent the actual background;
         ii) The low energy edge onsets are embedded in the background, meaning some edge becomes invisible.

Furthermore, plural inelastic scattering by plasmon excitation is a special concern when measuring the low energy loss (e.g. Li K-edge) because it is close to the low-energy plasmon region. For instance, double plasmon scattering distorts the pre-edge background and can mask the Li K-edge.

 

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