Electron microscopy
  
XRD of Cobalt Silicides
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Table 990. XRD of cobalt silicides.

Cobalt silicides XRD profiles
CoxSiy Cobalt silicides
X-ray analysis of the Co silicide films under various annealing conditions. 450 °C was the temperature to form the Co2Si phase from Co film. [1]  
XRD profile of samples of cobalt on undoped and doped polysilicon substrates after sinter at 600°C for 30 min
XRD profile of samples of cobalt on undoped and doped polysilicon substrates after sinter at 600°C for 30 min [2]

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

[1] K. Goto, A. Fushida, J. Watanabe, et al., A New Leakage Mechanism of Co Salicide and Optimized Process Conditions, IEEE Trans. Electron Devices, 46 (1999) p.117–23.
[2] S. P. Murarka and E. J. Lloyd, unpublished.

 

 
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