Practical Electron Microscopy and Database

Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix

XRD of Cobalt Silicides

Table 990. XRD of cobalt silicides. Cobalt silicides XRD profiles CoxSiy X-ray analysis of the Co silicide films under various annealing conditions. 450 °C was the temperature to form the Co2Si phase from Co film. [1]   XRD profile of samples of cobalt on undoped and doped polysilicon substrates after sinter at 600°C for 30 min [2]                               [1] K. Goto, A. Fushida, J. Watanabe, et al., A New Leakage Mechanism of Co Salicide and Optimized Process Conditions, IEEE Trans. Electron Devices, 46 (1999) p.117–23. [2] S. P. Murarka and E. J. Lloyd, unpublished.