Electron microscopy
  
TEM Imaging of Molybdenum Silicides
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Table 991. TEM images of molybdenum silicides.

Molybdenum silicides TEM images
MoSi2 structure of MoSi2 C11 type
The structure of MoSi2 C11 type is based on close packed MeSi2-layer sequences of AB. The B positions are the saddle point positions of the metal atoms of the next layer.  
MoSi2 nucleated at the interface and acts as a template for epitaxial growth of C54 TiSi2
MoSi2 nucleated at the interface and acts as a template for epitaxial growth of C54 TiSi2. [1]  
Mo5Si3 Ti/Mo/Si sample after annealing at 500 °C for 30 s
Ti/Mo/Si sample after annealing at 500 °C for 30 s. [2]

 

 

 

 

 

 

 

 

 

 

 

 

 

[1] J. A. Kittl, M. A. Gribelyuk, and S. B. Samavedam, Mechanism of low temperature C54 TiSi2 formation bypassing C49 TiSi2: Effect of Si microstructure and Mo impurities on the Ti–Si reaction path, Applied Physics Letters, 73, 7, 900, 1998.
[2] Lih J. Chen, Silicide Technology for Integrated Circuits, 2004.

 

 
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