Practical Electron Microscopy and Database

Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix

TEM Imaging of Molybdenum Silicides

Table 991. TEM images of molybdenum silicides. Molybdenum silicides TEM images MoSi2 The structure of MoSi2 C11 type is based on close packed MeSi2-layer sequences of AB. The B positions are the saddle point positions of the metal atoms of the next layer.   MoSi2 nucleated at the interface and acts as a template for epitaxial growth of C54 TiSi2. [1]   Mo5Si3 Ti/Mo/Si sample after annealing at 500 °C for 30 s. [2]                           [1] J. A. Kittl, M. A. Gribelyuk, and S. B. Samavedam, Mechanism of low temperature C54 TiSi2 formation bypassing C49 TiSi2: Effect of Si microstructure and Mo impurities on the Ti–Si reaction path, Applied Physics Letters, 73, 7, 900, 1998. [2] Lih J. Chen, Silicide Technology for Integrated Circuits, 2004.