Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| MOS image sensors are built using metal-oxide-semiconductor (MOS) technology, which is widely utilized in integrated circuits and semiconductor devices. MOS technology involves creating a structure with a metal gate, an oxide insulating layer, and a semiconductor substrate, typically silicon. This approach is fundamental in fabricating components like transistors, which are essential in the readout circuitry of the sensor. In this MOS image sensor, MOS transistors are used to control each pixel's response to light, as well as to read out and process the electrical signals generated by the photodiodes when exposed to light. The technology also allows for compact pixel designs and high integration levels, making it ideal for applications requiring small, efficient, and high-performance sensors, like digital cameras and mobile phone cameras.
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