Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Figure 1024 shows Intel 65 nm technology corresponding to the second generation of uniaxial strained Si for enhanced performance (Lg = 35 nm, Tox = 1.2 nm). [1]
[1] S. Thompson, 2005.
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