| F |
fluorine |
| F/I |
final inspection |
| FA |
failure analysis |
| FAB |
fast atom bombardment |
| FAMOS |
floating-gate avalanche-injection metal-oxide semiconductor |
| FBGA |
fine-pitch ball grid array |
| FC |
flip chip |
| FCM |
facilities cost model |
| FCS |
factory control system |
| FDC |
fault detection and classification |
| FDE |
frequency domain experiments |
| FDSOI |
fully depleted silicon on insulator |
| Fe |
iron |
| FEC |
fabrication evaluation chip |
| FEM |
finite element model |
| FEOL |
front end of line |
| FESEM |
field emission scanning electron microscopy |
| FET |
field-effect transistor |
| FFT |
fast Fourier transform |
| FFU |
filter fan unit |
| FI |
filterability index; factory integration |
| FIB |
focused ion beam |
| FID |
flame ionization detector |
| FIFO |
first-in |
| FIMS |
front-opening interface mechanical standard |
| FL |
fuzzy logic |
| FLOPC |
floating point operations needed per cycle |
| FLOTOX |
floating gate tunnel oxide |
| FLRT |
factory layout/relayout tool |
| FM |
foreign material |
| FMEA |
failure mode and effects analysis |
| FMMC |
factory material movement component |
| FMVP |
Framework Member Validation Project |
| FNN |
feed-forward neural network |
| FOCS |
fiber-optic chemical sensor |
| FOSB |
front opening shipping box |
| FOUP |
front opening unified pod |
| FOV |
field of view |
| FOX |
field oxide |
| FP |
flash point |
| FPD |
focal plane deviation; flat panel display |
| FPGA |
field-programmable gate array |
| FPLA |
field-programmable logic array |
| FPLF |
field-programmable logic family |
| FPLS |
field-programmable logic switch |
| FPMS |
Factory Performance Modeling Software |
| FPROM |
field-programmable read-only memory |
| FRACAS |
Failure Reporting |
| FRAME |
Failure Rate Analysis and Modeling |
| FRMB |
fast ramp mini batch |
| FSG |
fused silica glass |
| FSM |
finite state machine |
| FT |
final test; Fourier transform |
| FTA |
fault tree analysis |
| FTAB |
Focus Technical Advisory Board |
| FTIR |
Fourier transform infrared |
| FW |
full wave |
| FWHM |
full-width half-maximum |
| FZ |
float zone |
| Ga |
gallium |
| GAC |
granular activated carbon |
| GC |
gas chromatography; gravimetric calibrator |
| GCC |
generic cell controller |
| GCD |
gas chromatography distillation |
| GCMS |
gas chromatography mass spectroscopy |
| GDPP |
gas drive plasma pinch |
| GDS |
graphical design system; graphical design software |
| Ge |
germanium |
| GEM |
Generic EquipmentModel |
| GEMVS |
GEM verification system |
| GES |
generic equipment simulator |
| GFC |
gas filter correlation |
| GFCI |
ground fault circuit interrupter |
| GIDL |
gate-induced drain leakage |
| GILD |
gas immersion laser doping |
| GLC |
gas liquid chromatography |
| GOI |
gate oxide integrity |
| GPIB |
general-purpose interface bus |
| GSCE |
gas source control equipment |
| GTS |
GEM Test System |
| H |
hydrogen |
| HAP |
hazardous air pollutant |
| HARI |
high aspect ratio inspection |
| HAST |
highly accelerated stress testing |
| HAZCOM |
Hazard Communication Standard |
| HB |
horizontal Bridgeman crystal |
| HCI |
hot carrier injection |
| HCM |
hollow cathode magnetron |
| HCMOS |
high-density CMOS |
| HCS |
hot-carrier suppressed |
| HD |
high density |
| HDL |
hardware description language |
| HDP |
high-density plasma |
| HDPE |
high-density polyethylene |
| He |
helium |
| HEM |
high-efficiency matching |
| HEPA |
high-efficiency particulate air |
| Hf |
hafnium |
| HF |
hydrofluoric acid |
| Hg |
mercury |
| HIBS |
heavy ion backscattering spectrometry |
| HiPOx |
high-pressure oxygen |
| HLF |
horizontal laminar flow |
| HMDS |
hexamethyldisilizane |
| HMIS |
hazardous materials inventory statement |
| HMMP |
hazardous materials management plan |
| HMOS |
high-performance MOS; high-density MOS |
| HOMER |
hazardous organic mass emission rate |
| HOPG |
highly oriented pyrolitic graphite |
| HP |
high purity |
| HPEM |
Hybrid Plasma Equipment Model |
| HPI |
high pressure isolation |
| HPL |
high-performance logic |
| HPLC |
high-performance liquid chromatography |
| HPM |
hazardous production materials; high-purity metal |
| HPV |
high-pressure vent |
| HRA |
human reliability analysis |
| HRR |
high ramp rate |
| HRTEM |
high-resolution transmission electron microscopy |
| HSQ |
hydrogen silsesquioxane |
| HTO |
high-temperature oxidation |
| HTRB |
high-temperature reverse bias |
| HUPW |
hot ultrapure water |
| HVAC |
heating |
| I |
iodine |
| I/O |
input/output |
| I2L |
integrated injector logic |
| I300I |
International 300 mm Initiative |
| IC |
integrated circuit; Investment Council; ion chromatography |
| ICAP |
inductively coupled argon-plasma spectrometry |
| ICMS |
integrated circuit measurement system |
| ICP |
inductively coupled plasma |
| ICP-AES |
inductively coupled plasma atomic emission spectroscopy |
| ICP-MS |
inductively coupled plasma mass spectrometry |
| ICT |
ideal cycle time |
| IDDQ |
direct drain quiescent current |
| IDEAL |
initiating |
| IDL |
interface definition language |
| IDLH |
immediately dangerous to life or health |
| IDS |
interactive diagnostic system |
| IEA |
ion energy analysis |
| IEC |
infused emitter coupling |
| IEDF |
ion energy distribution function |
| IERN |
internal-external recurrent neural network |
| IF |
interface |
| IGFET |
insulated-gate field-effect transistor |
| ILB |
inner lead bond |
| ILD |
interlevel dielectric; interlayer dielectric |
| ILS |
intracavity laser spectroscopy |
| IM |
integrated model; integrated metrology |
| IMD |
intermetal dielectric |
| IMMA |
ion microphobe mass analysis |
| IMS |
ion mobility spectroscopy |
| In |
indium |
| INCAMS |
individual cassette manufacturing system |
| IPA |
isopropyl alcohol |
| IPL |
ion projection lithography |
| IPT |
ideal process time |
| Ir |
iridium |
| IR |
infrared |
| IRAS |
infrared reflection-absorption spectroscopy |
| IRIS |
imaging of radicals interacting with surfaces |
| IRN |
internal recurrent neural network |
| IRONMAN |
Improving Reliability of New Machines at Night |
| IRTC-1 |
interconnect reliability test chip-1 |
| IS |
information systems; interface specifications; integrated systems |
| ISC |
Industry Steering Council |
| ISEM |
inspection/review specific equipment model |
| ISM |
inductor super magnetron |
| ISMT |
International SEMATECH |
| ISPM |
in situ particle monitor |
| ISR |
in situ rinse |
| ISS |
ion scattering spectroscopy |
| ITRI |
Interconnection Technology |
| ITRS |
International Technology |
| IVH |
interstitial via hole |
| IVP |
integrated vacuum processing |
| JDP |
Joint Development Program |
| JEDEC |
Joint Electron Device Engineering Council |
| JESSI |
Joint European Submicron Silicon Initiative |
| JIC |
Joint Industrial Council |
| JIT |
just-in-time |
| JJT |
Josephson junction transistor |
| JVD |
jet vapor deposition |
| K |
potassium; thousand |
| keV |
kilo electron volt |
| KPA |
key process area |
| Kr |
krypton |
| kV |
kilovolt |
| La |
lanthanum |
| LAMMA |
laser micro-mass analysis |
| LAMMS |
laser micro-mass spectroscopy |
| LC |
inductance-capacitance; liquid chromatography |
| LCA |
lifecycle analysis |
| LCC |
leaded chip carrier |
| LCL |
lower confidence limit |
| LDD |
lightly doped drain |
| LDL |
lower detection limit |
| LDP |
low-density plasma |
| LDPE |
low-density polyethylene |
| LEC |
liquid encapsulated Czochralski crystal |
| LEL |
lower explosive limit |
| LER |
line edge roughness |
| LF |
laminar flow |
| LFL |
lower flammable limit |
| LGQ |
linear Gaussian quadratic |
| Li |
lithium |
| LI |
laser interferometry |
| LIC |
linear integrated circuit |
| LID |
leadless inverted device |
| LIFO |
last in |
| LIMA |
laser-induced mass analysis |
| LIMS |
laser-induced mass spectrometry |
| LLCC |
leadless chip carrier |
| LLD |
lower limit of detection |
| LLNQ |
least lots next queue |
| LM |
light microscope |
| LMMA |
laser microprobe mass analysis |
| LOCOS |
local oxidation of silicon |
| LOS |
loss of selectivity |
| LPC |
linear predictive coding; laser particle counter; low particle concentration; liquid-borne particle counter |
| LPCVD |
low-pressure chemical vapor deposition |
| LPD |
light point defect |
| LPE |
liquid phase epitaxy |
| LPI |
low-pressure isolation |
| LPP |
laser-produced plasma |
| LRS |
laser Raman spectroscopy |
| LSE |
latex sphere equivalent |
| LSHI |
large-scale hybrid integration |
| LSI |
large-scale integration |
| LSM |
laser scanning microscope |
| LTA |
laser thermal anneal |
| LTCVD |
low-temperature chemical vapor deposition |
| LTO |
low-temperature oxidation/oxide |
| LTPD |
lot tolerance percent defective |
| LTV |
local thickness variation |
| LV |
latent variable |
| LVDT |
linear voltage differential transducer |
| LVI |
low-voltage inverter |
| LVS |
layout verification of schematic |
| LWR |
linewidth reduction |
| LWS |
large wafer study |
| M |
million; mega |
| MACT |
maximum achievable control technology |
| MALDI |
matrix-assisted laser desorption and ionization |
| MAN |
metropolitan area network |
| Management |
Standard |
| Manufacturing |
and Science |
| MAP |
manufacturing automation protocol |
| Master |
Deliverables List |
| MAWP |
maximum allowable working pressure |
| MB |
machine batch |
| MBC |
machine bath collection |
| MBE |
molecular beam epitaxy |
| MBPC |
model-based process control |
| MBTC |
model-based temperature control |
| MCBA |
mean cycles between assists |
| MCBF |
mean cycles between failures |
| MCBI |
mean cycles between interrupts |
| MCM |
multichip module; manufacturing cycle management |
| MCP |
master control processor;multichip package |
| MCS |
material control system |
| MCU |
microprocessor control unit; mobile calibration unit |
| MCVD |
metal chemical vapor deposition |
| MDL |
minimum detection limit; |
| MD-MOS |
multi-drain metal-oxide semiconductor |
| MDQ |
market-driven quality |
| MEBS |
medium energy backscattering spectrometry |
| MEEF |
mask error enhancement factor |
| MEMS |
microelectromechanical system |
| MERIE |
magnetically enhanced reactive ion etching |
| MES |
manufacturing execution systems |
| MESFET |
metal-semiconductor field-effect transistor |
| METS |
Materials and Equipment Trading Service |
| MeV |
mega electron volt |
| MFC |
mass flow controller |
| MFM |
mass flow meter |
| Mg |
magnesium |
| MG |
manufactured goods |
| MHI |
material hazard index |
| MHz |
megahertz |
| MIC |
monolithic integrated circuit |
| MID |
material ID |
| MIE |
magnetron ion etching |
| MIM |
metal-insulator-metal |
| MIS |
metal insulator silicon |
| MLCC |
multilayer ceramic capacitor |
| MLL |
modify lot location |
| MLM |
multilevel metal |
| MLR |
message log report |
| MMC |
Manufacturing Methods Council |
| MMD |
Microlithographic Mask Development program |
| MMIC |
monolithic microwave integrated circuit |
| MMM |
material movement management |
| MMMS |
Material Movement |
| MMO |
multimodel optimization |
| MMOS |
modified MOS |
| MMST |
Microelectronics Manufacturing Science and Technology |
| Mn |
manganese |
| MNOS |
metal-nitride-oxide semiconductor |
| MNS |
metal-nitride semiconductor |
| Mo |
molybdenum |
| MO |
metal-organic |
| MOCVD |
metal-organic chemical vapor deposition |
| MOP |
modify operating procedures |
| MOS |
metal-oxide semiconductor |
| MOS-C |
metal-oxide semiconductor capacitor |
| MOSFET |
metal-oxide semiconductor field-effect transistor mp melting point |
| MP |
massively parallel |
| MP-OES |
multipoint optical emission spectroscopy |
| MPRES |
modular plasma reactor simulator |
| MPU |
microprocessor unit |
| MRP |
materials requirements planning |
| MRP-II |
manufacturing resource planning |
| MS |
mass spectrometry; mass spectroscopy |
| MSDS |
Material Safety Data Sheet |
| MSEM |
Metrology Specific Equipment Model |
| MSG |
Management Steering Group |
| MSHA |
Mine Safety and Health Administration |
| MSI |
medium-scale integration; manufacturing support item |
| MSID |
mass spectrometer lead detector |
| MSLD |
mass spectrometer leak detector |
| MSTAB |
Manufacturing Systems Technical Advisory Board |
| MTBA |
mean time between assists |
| MTBF |
mean time between failures |
| MTBFp |
mean (productive) time between failures |
| MTBI |
mean time between interrupt; mean time between incident |
| MTOL |
mean time off line; mean time on line |
| MTS |
Material Tracking Standard |
| MTTA |
mean time to assist |
| MTTF |
mean time to failure |
| MTTR |
mean time to repair |
| MV |
megavolt |
| MVTR |
moisture vapor transmission rate |
| MW |
molecular weight |
| MWBC |
mean wafers between cleans |
| MWT |
monitor wafer turner |
| N |
nitrogen |
| Na |
sodium |
| NA |
numerical aperture |
| NCMS |
National Center for |
| NCS |
Network Communication Standard |
| NDA |
nondisclosure agreement |
| NDE |
nondestructive evaluation |
| NDIR |
nondispersive infrared spectroscopy |
| NDP |
neutron depth profiling |
| NDT |
nondestructive testing |
| NDUV |
nondispersive ultraviolet spectroscopy |
| NEC |
National Electric Code |
| NESHAP |
National Emissions Standards for Hazardous Air Pollutants |
| NFOM |
near-field optical microscopy |
| NGL |
next-generation lithography |
| Ni |
nickel |
| NIL |
nanoimprint lithography |
| NIRA |
near-infrared reflection analysis |
| NMOS |
negative channel metal-oxidesemiconductor |
| NMR |
nuclear magnetic resonance |
| NN |
neural network |
| NRE |
nonrecurring engineering |
| NTRS |
National Technology Roadmap for Semiconductors |
| NTU |
nephelometric turbidity unit |
| NVR |
non-volatile residue |
| O |
oxygen |
| OBA |
object behavior analysis |
| OBEM |
Object-Based Equipment Model |
| OBIC |
optical beam-induced current |
| OBL |
object-based language |
| OC |
open cassette |
| OCR |
optical character recognition |
| OD |
outside diameter |
| ODS |
ozone-depleting substances |
| OEE |
overall equipment effectiveness |
| OEM |
original equipment manufacturer |
| OES |
optical emission spectroscopy |
| OHT |
overhead transport; overhead hoist transport |
| OHV |
overhead vehicle |
| OL |
overlay |
| OLB |
outer lead bond |
| OLE |
object linking and embedding |
| OM |
operational modeling; optical microscopy |
| OMA |
object management architecture |
| OMS |
optical mass spectroscopy |
| OMT |
object modeling technique |
| OO |
object-oriented |
| OOA |
object-oriented analysis |
| OOD |
object-oriented design |
| OODB |
object-oriented database |
| OODBMS |
object-oriented database management system |
| OOP |
object-oriented programming |
| OPC |
optical particle counter; optical proximity correction |
| OS |
operating system |
| OSD |
organic spin-on dielectric |
| OSF |
Open Systems Foundation |
| OSG |
organosilicate glass |
| OSI |
open system interconnection |
| OSRM |
Office of Standard Reference Materials |
| OSS |
Object Services Standard |
| Ox |
oxide |
