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Isotropic Wet Etch - Practical Electron Microscopy and Database - - An Online Book - |
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| Microanalysis | EM Book https://www.globalsino.com/EM/ | ||||||||
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The main solutions for isotropic chemical etching in microelectronics are Hydrofluoric Acid (HF) used for silicon dioxide, Phosphoric Acid (H3PO4) for silicon nitride, and Hydrofluoric Nitric Acidic (HNA) for Silicon etc. Here, nitric acid is HNO3.
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