Hydrofluoric Acid (HF)
- Practical Electron Microscopy and Database -
- An Online Book -


This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


Table 2440. Etchants used in semiconductor manufacturing.

SiO2(Silicon oxide)
Dilute hydrofluoric acid (DHF)
Buffered HF (BHF)
Alkaline hydroxide + organic
Si3N4(silicon nitride)-selective to SiO2
Boiling phosphoric acid (H3PO4)
Si3N4/SiO2 (non-selective)
Hydrofluoric acid + organic

Si is easily oxidized in air during mechanical polishing for EM analysis. In some critical analyses (e.g. Si surface plasmon analysis) in EELS, Si TEM specimens are normally dipped in HF solution (e.g. 10% HF solution) to remove the surface oxide. However, a thin layer of SiOx may still exist due to exposure to air before loading into the TEM.






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