Face-centered Orthorhombic Structure
- Practical Electron Microscopy and Database -
- An Online Book -


This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


The TiSi2 formed by solid state reaction of between Ti and Si films has two different structures: the C49 (base-centered orthorhombic) structure formed between 450 °C and 650 °C, and the C54 (face-centered orthorhombic) structure formed above 650 °C. The C49 TiSi2 is a metastable phase and is usually the first crystalline phase to form in the reaction between Ti and Si, while the C54 TiSi2 phase is a stable phase, having a lower electrical resistivity than the C49 phase. Both crystal structures have similar atomic arrangements with a hexagonal array of Si atoms around Ti atoms at the center, but the staking arrangement of the unit cells are different:  the C49 phase has a two-layer repeat while the C54 phase has a four-layer repeat.




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