Short Circuit Failure due to Electromigration in ICs
- Practical Electron Microscopy and Database -
- An Online Book -

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Electromigration in Al can occur under the influence of an electric field in ICs. The electromigration induces voids, resulting in discontinuities, in the metallization runners, that causes circuit opening and/or pileups that can cause short circuit failure to adjacent conductors. The electromigration resistance of Al can be increased by alloying with copper at low concentrations, e.g. ~ 0.5%.

 

 

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