Copper Silicide
- Practical Electron Microscopy and Database -
- An Online Book -

http://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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Copper migrating into silicon active areas can form copper silicide precipitates resulting in leakage current at source and drain shallow junctions.

 

 

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The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. You can click How to Cite This Book to cite this book. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.



 
 
 
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