This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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The well known Moore’s Law states that the silicon-data density on a chip doubles every 18 months.

The people now believe that the scaling limit to Moore’s law is lithography because of the need for shorter wavelengths of light to pattern the smaller feature sizes. Therefore, materials are now a key constraint in silicon technology. For example, the current density of conductors in ICs can be increased by using copper instead of aluminium. The RC time delays can be minimized using materials with lower dielectric constants instead of  SiO₂. Leakage in MOS structures can be minimized using materials, with high dielectric constants, between the gate and the silicon channel in FET in stead of SiO₂.