Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Preferential Electron-Beam Etching of Grain Boundaries can provide an explanation for the small but measurable sputtering observed from silver nnanoparticles (e.g. 6 – 14 nm in diameter) when exposed to 200 keV electrons [1].
[1] N. Braidy, Z. J. Jakubek, B. Simard, G. A. Botton, Microsc. Microanalysis 14 (2008) 166.
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