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Local heating induced by energetic ion and electron beams [1,2] leads to various effects such as bending of nanopillars [3], diffusion of substrate atoms into the nanostructures [4], enhancement of the adhesion between thin films [5–7] and focused ion beam lithography for MOSFET devices [8].
[1] Y.M. Parka, D.S. Koa, K.W. Yia, I. Petrovb, Y.W. Kim, Ultramicroscopy 107 (2007)
663.
[2] D.F. Peach, D.W. Lane, M.J. Sellwood, Nucl. Instrum. Methods B 249 (2006)
677.
[3] S.K. Tripathi, N. Shukla, S. Dhamodaran, V.N. Kulkarni, Nanotechnology 19 (2008)
205302.
[4] S.K. Tripathi, N. Shukla, V.N. Kulkarni, Nanotechnology 19 (2008) 465302.
[5] N. Shukla, S.K. Tripathi, M. Sarkar, N.S. Rajput, V.N. Kulkarni, Nucl. Instrum.
Methods B 267 (2009) 1376.
[6] C.R. Wie, C.R. Shi, M.H. Mendenhall, R.P. Livi, T. Vreeland Jr., T.A. Tombrello, Nucl.
Instrum. Methods B 9 (1985) 20.
[7] D.K. Sood, J.E.E. Baglin, Nucl. Instrum. Methods B 19/20 (1987) 954.
[8] J. Melngailis, J. Vac. Sci. Technol B5 (1987) 469.
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