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CF4 gas - Practical Electron Microscopy and Database - - An Online Book - |
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| Microanalysis | EM Book http://www.globalsino.com/EM/ | ||||||||
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CF4 gas is used for passivation (Si3N4 and SiO2) etch or photo-resist strip (PRS) by using a mixture of O2 and CF4 gases.
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