Electron microscopy
  
Amorphous Layer Formed during EM Sample Preparation using Ar Milling
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Figure 1428 shows that the thickness of the amorphization layer induced by Ar ion milling on sample surfaces can be reduced by lowering both the ion accelerating voltage and the incident ion-milling angle (α).

Relationship among the amorphization thickness induced by Ar ion milling, the ion accelerating voltage and the incident ion-milling angle

Figure 1428. Relationship among the amorphization thickness, the ion accelerating voltage and the incident ion-milling angle. Adapted from [1] Here, α1 = 23°, α2 = 13°, and α3 = 3°.

 

 

 

 

 

 

[1] McCaffrey J.P. et al Ultramicroscopy 87, 97, (2001).

 

 
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