Current Density Scaling of Interconnects in ICs
- Practical Electron Microscopy and Database -
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This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


In the interconnects of ICs, three distinct trends are induced due to scaling:

        i) Driven by Moore’s law, the widths of metal interconnects decrease exponentially. As a result, the overall cross-sectional area of interconnect is reduced.
        ii) With increasing integration of functionality and passive devices the total interconnect length is exploding as well so that there are more wires on a die.
        iii) Currents are not scaling proportionally to shrinkage of wire widths and thus, the current densities in modern ICs are extremely high.

Figure 2891 shows the current density scaling of interconnects in ICs.

the width scaling of interconnects and the current density scaling in ICs

Figure 2891. The current density scaling.




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