Electron microscopy
CMP Scratches
- Practical Electron Microscopy and Database -
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This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


Node-to-node and node-to-power line shorting in memories can occur through CMP scratches [1]. This type of shorting is normally on the order of a tenth of a micron or larger.



[1] Soon-Moon Jung, Jun-Sup Uom, Won-Suek Cho, Yong-Joon Bae, Yeon-Kyu Chung, Kwang-Suk Yu, Kil-Yeon Kim, Kyung-Tae Kim, A study of formation and failure mechanism of CMP scratch induced defects on ILD in a W-damascene interconnect SRAM cell, in: Proceedings of the 39th Annual International Reliability Physics Symposium, Orlando, FL, 2001, p. 42.



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