Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Charge-induced SE (secondary electron) contrast is well known in conventional (high vacuum) scanning electron microscopy (SEM) observation of materials, e.g. insulators [1–3], insulator–conductor composites [4], passivated semiconductors [5] and superconductors [6]. This charging phenomenon causes difficulties in the control of charging artifacts, inducing degradations of imaging and spatial resolution [7]. In fact, in a controlled gaseous environment and low vacuum SEM, the effects of inhomogeneous specimen charging on image contrast can be controlled, resulting in stable contrast and utilized for the characterization of a wide range of dielectrics [8].
[1] R.D. Van Veld, T.J. Shaffner, in: O.M. Johari (Ed.),
Scanning Electron Microscopy, 1971, p. 17.
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