This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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The scanning electron microscopes (SEM) provide an excellent platform for three-dimensional (3-D) imaging in the scale range of ~20 nm to 100 μm. Furthermore, dual-beam systems that have both electron-optical and ion-optical columns, have been applied in microanalysis. The dual-beam techniques enable a focused ion beam (normally with gallium beam) to mill thin slices sequentially and the electron beam to image each exposed surface using secondary or back scattered electrons, or EDS elemental mapping. However, the lateral spatial resolution (e.g. ~5 nm for SEM) is finer than the slice thickness (typically ~100 nm) so that the 3-D resolution function is anisotropic.