Practical Electron Microscopy and Database

An Online Book, Second Edition by Dr. Yougui Liao (2006)

Practical Electron Microscopy and Database - An Online Book

Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix

Beam Blanking with an Electrostatic Deflector in EMs and FIB

The beam blanking deflectors in both EMs and FIB have similar functions. In this case, an electrostatic deflector is used to rapidly switch an electron beam on and off by deflecting or blanking the beam during specific intervals. This creates pulsed electron bursts. The key features of beam blanking with electrostatic deflectors are:

  • Beam blanking controls the pulse duration by electrically switching the beam.
  • Typically operates with microsecond to nanosecond pulse durations.
A fast beam blanker which temporarily deflects a continuous electron beam can be used to produce electron pulses.

The Electrostatic Dose Modulator (EDM) developed by JEOL is an advanced beam blanking system designed for use in TEM and STEM imaging. It features a fast pre-sample electrostatic deflector that switches the electron beam on or off in less than 20 nanoseconds, dramatically improving image clarity for fast exposure times. The EDM allows precise control over the electron dose applied to samples without altering the imaging conditions, making it ideal for experiments requiring dose structuring with pulses as short as 100 nanoseconds and frequencies up to 1 MHz. The system supports both TEM and STEM applications, with modern control software for programmable dose attenuation and logging, and integrates easily with other hardware. Its flexibility and speed enhance both standard imaging and dynamic experiments such as pump-probe dynamics.

Table 2464 lists the function of each part in the FIB, including the beam blanking deflector.

Table 2464. The function of each part in the FIB.

Part
Function
LMIS
Ion source
Suppressor
Improves the distribution of extracted ions
Extractor
High tension used for ion extraction: Typical accelerating voltage in FIB systems ranges from 1 to 30 keV
Spray aperture
First refinement
1st lens (condenser lens)
Parallelize the ion beam: probe forming
Upper octopole
Stigmator
Beam defining aperture
Defines current: A set of apertures define the probe size and provides a range of ion currents (10 pA – 30 nA)
Blanking deflector
Beam blanking: Beam blankers are used to deflect the beam away from the centre of the column
Blanking aperture
Beam blanking
Lower octopole
Raster scanning
2nd lens (objective lens)
Beam focusing