Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| The FIB sputtering phenomenon is known as “V-shape”, and its exact shape depends on the competition between sputtering and redeposition for a given material. In order to obtain a large area with uniform thickness, V-shape should be compensated. Therefore, it is necessary to tilt both sides of the specimen into the Ga+ ion beam prior to the final polishing steps. For instance, a Zn specimen should be tilted ±14° into the ion beam.
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