Large Uniform-thickness FIB-TEM Specimen Preparation
- Practical Electron Microscopy and Database -
- An Online Book -

https://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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The FIB sputtering phenomenon is known as “V-shape”, and its exact shape depends on the competition between sputtering and redeposition for a given material. In order to obtain a large area with uniform thickness, V-shape should be compensated. Therefore, it is necessary to tilt both sides of the specimen into the Ga+ ion beam prior to the final polishing steps. For instance, a Zn specimen should be tilted ±14° into the ion beam.

 

 

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