Electron microscopy
Electron Beam Lithography (EBL)
- Practical Electron Microscopy and Database -
- An Online Book -
Microanalysis | EM Book                                                                                   https://www.globalsino.com/EM/        

This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


Electron beam lithography (EBL) is similar to FIB lithography. For EBL, the major factor limiting the reduction of feature sizes in integrated circuits (ICs) is the so-called proximity effect due to backscattered electrons. However, this effect does not exist in FIB lithography.



The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.