Electrical Failure Analysis (EFA) for ICs
- Practical Electron Microscopy and Database -
- An Online Book -


This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.


The frequently used electrical failure analysis (EFA) techniques are:
        i) Photon emission techniques, including MerCAD and InGaAs;
        ii) Laser based techniques, including TIVA, LIVA, laser Seebeck effect imaging, and OBIRCH;
        iii) Thermal emission techniques, including NIR, MWIR, InSb, and IR;
        iv) Beam based techniques, including LVP, LVI, and voltage contrast;
        v) Micro/Nano-probing, including AFM, and Zyvex probe;
        vi) Fault simulation methods




The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.