This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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The frequently used electrical failure analysis (EFA) techniques are:
        i) Photon emission techniques, including MerCAD and InGaAs;
        ii) Laser based techniques, including TIVA, LIVA, laser Seebeck effect imaging, and OBIRCH;
        iii) Thermal emission techniques, including NIR, MWIR, InSb, and IR;
        iv) Beam based techniques, including LVP, LVI, and voltage contrast;
        v) Micro/Nano-probing, including AFM, and Zyvex probe;
        vi) Fault simulation methods