Table of Contents/Index
Chapter/Index:
Introduction |
A | B |
C |
D |
E |
F |
G |
H |
I |
J |
K |
L |
M |
N |
O |
P |
Q |
R |
S |
T |
U |
V |
W |
X |
Y |
Z |
Appendix
| I (body-centered) lattices/I-centering & their space groups |
|
| Orthorhombic |
| I222 (23) |
I212121 (24) |
| Imm2 (44) |
Iba2 (45) |
| Ima2 (46) |
Immm (71) |
| Ibam (72) |
Ibca (73) |
| Imma (74) |
| Tetragonal |
| I4 (79) |
I41 (80) |
| I-4 (82) |
I4/m (87) |
| I41/a (88) |
I422 (97) |
| I4122 (98) |
I4mm (107) |
| I4cm (108) |
I41md (109) |
| I41cd (110) |
I-4m2 (119) |
| I-4c2 (120) |
I-42m (121) |
| I-42d (122) |
I4/mmm (139) |
| I4/mcm (140) |
I41/amd (141) |
| I41/acd (142) |
| Cubic |
| I23 (197) |
I213 (199) |
| Im-3 (204) |
Ia-3 (206) |
| I432 (211) |
I4132 (214) |
| I-43m (217) |
I-43d (220) |
| Im-3m (229) |
Ia-3d (230) |
| Comparison between Space Group P1 and Space Group Irnmm |
|
| Ice formation in EM observations |
Icosahedral short-range ordering |
| Icosahedral quasicrystals (IQCs) |
ICP: Comparison among TEM, APT, ToF SIMS and ICP-MS |
| Ideal/perfect lenses in EMs |
III-V compounds |
| iFast (Integrated Fast Automation Software Technology) |
| Illumination in EM systems |
| Illumination in TEM mode |
Illumination in STEM mode |
| Imaging geometries of TEM and STEM systems |
Comparison between Electron-Beam-Probing (eBP) and Laser Voltage Imaging/Probing (LVI/LVP) |
| Coherent illumination in EMs |
|
| Parallel illumination in EMs |
Electron beam convergence |
| Effects of axial illumination conditions in TEM system |
Maximum usable illumination angle in STEM |
| Uneven illumination effect on Fourier transform in TEM |
Effects of illumination coherence on spatial resolution in TEMs |
| Illuminating spot size & intensity changed by condenser lens |
|
| Image |
| Image-forming lens system in (S)TEM systems |
Image curvature in EMs |
| TEM image formation/imaging process |
Image-forming Cs-corrector |
| Electron Voltage Imaging (EVI) and Electron Voltage Probing (EVP) |
|
| Image quality in EMs |
Image helical rotation and inversion when changing magnification or focusing |
| Electronic optical imaging sensors/Image sensors |
Image spectroscopy/imaging spectrum (IS) |
| Morphological image processing |
|
| Image shift/drift in TEM |
| Minimization of image drift and other instabilities |
Young’s fringes produced by TEM image shift (with and without monochromator) |
| Aberration determinations by image shift due to tilting illumination |
Image-shift function and its lens in TEM |
| Image plane |
| Diffraction pattern formed in imaging condition/image plane/objective plane |
Electron wavefunction in image plane in real space and reciprocal space |
| Image series reconstructions |
| TEM spatial resolution improved by defocus series |
|
| Imaging conditions |
| Best TEM imaging conditions |
|
| Immersion |
| In-lens (immersion lens/through-the-lens) SEM detectors |
Symmetric immersion lens as objective lens in SEM systems |
| Symmetric immersion lens as objective lens in SEMs |
|
| |
| Impact parameter |
Challenges in in-line SEM inspection on wafers |
| Implantation |
| Silicon/nitrogen implantation application to suppress IC failure |
Defects in crystals formed by ion-implantation and annealing |
| |
| In-focus in electron microscopy |
In-column energy filters & spectrometers |
| In-line electron holography |
In-line/Gabor’s holography |
| Incoherent aberrations in EMs |
|
Chromatic aberration and its coefficient |
Incoherence/energy spread in SEM imaging |
| Incoherent electrons |
| Incoherent thermal diffuse scattering (TDS) electrons in (S)TEM |
STEM/TEM imaging with incoherent electrons |
| Incoherence & HAADF |
|
| |
| Incoherent coincidence site lattice (CSL) boundary |
Incommensurate phases |
| Incomplete charge collection in EDS measurements |
|
| Index of refraction |
Index of refraction of electron lenses |
| Indexing electron diffraction patterns of crystal structures |
| Indexing Kikuchi lines |
Indexing SAD (selected area diffraction) patterns |
| Indexing CBED patterns |
Indexing HOLZ patterns |
| Diffraction comparison between different cubic crystal structures |
Miller indices |
| Phase identification with XRD and its procedure |
Indexing electron diffraction patterns starting with zone axis |
| Examples of indexed electron diffraction patterns of HCP crystals |
Examples of indexed electron diffraction patterns of FCC crystals |
| Low index planes |
Zone axis determined by cross-product |
| Examples of indexed electron diffraction patterns of rhombohedral crystals |
Example of indexing electron diffraction pattern from twins |
| Automatically indexing TEM electron diffraction patterns using machine learning |
|
| Indium (In) |
EDS measurement of indium (In)
|
| AlGaInP |
InN |
| InP |
InAs |
| Compound semiconductor |
Phase diagram of In-X |
| |
| Indirect aberration corrections |
|
| Indirect interband transition |
Indirect bandgap |
| Inelastic scattering mechanisms |
| Inelastic collision/scattering between energetic electrons and materials |
"Mixed" inelastic scattering and its EELS |
| Phonon excitation (heat) |
Collective plasmon excitation (valence electrons). |
| Single electron excitation, including inner (direct ionization of core levels) and outer shell scattering. |
Direct radiation losses (Bremsstrahlung radiation). |
| Excitation of conducting electrons leading to secondary electron emissions. |
|
| Inelastic scattering from outer-shell electrons shown in EELS profile |
Angle of inelastic scattering |
| Cross-section for inelastic scattering in EELS measurements |
Electron inelastic differential cross section |
| Delocalization in inelastic scattering |
Spatial resolution of inelastic signals |
| Intensity comparison between elastic and inelastic scatterings |
Theory on inelastic mean free path (IMFP) of electrons |
| Dependence of inelastical scattering of electrons on atomic number |
Dependence of single and multiple inelastical scatterings of electrons on TEM sample thickness |
| Mean free path of electron scattering (elastic and inelastic) |
Inelastical phonon excitation and thermal diffuse scattering (TDS) of electrons in EMs |
| Elastic-inelastic multislice simulation for EELS |
Impact of anisotropy on EELS intensity in anisotropic materials |
| EELS intensity depending on areal density of atoms |
Intensity of EELS core-loss signal |
| Inelastic imaging |
|
| Difference of focus depth for inelastic (core-loss EFTEM) and elastic imaging |
|
| Information limit of a microscope |
Information limit/transfer in HRTEM |
| Information loss in HRTEM measurements |
|
| Infrared |
|
| Infrared optical fibers |
Infrared windows |
| Comparison between infrared spectroscopy and EELS |
|
| Inner-shell electron |
|
| Inner-shell excitation in electron energy loss spectroscopy |
Ground-state energy of inner-shell electron |
| Excitation of inner-shell electrons |
|
| Input dialogs and popup windows of scripts for DM |
|
| In Situ/Environmental TEM/STEM Observations |
In situ FIB lift-out TEM sample preparation |
| History of In Situ/environmental TEM/STEM observations |
Vacuum sealed electron transparent windows for in-situ TEM |
| Thermal-diffuse-scattering in in-situ heating HAADF-STEM |
|
| In-situ heating in TEM |
| Black-white diffraction contrast due to formation of loops & defect clusters |
In-situ TEM observations of chemical processes |
| In situ observations |
| In situ observation in optical microscopes |
In situ observation in cathodoluminescence imaging |
| In situ SEM observation of electromigration |
In Situ liquid TEM/STEM analysis |
| Instability |
| Specimen (stage) drift/instability/movement in TEMs/STEMs |
Electron beam drift/instability/movement in TEMs/STEMs |
| Instability of TEM imaging due to charging |
Instability of electron gun emission |
| Instability in accelerating voltage of electron beam |
|
| Multi beam inspection tool from ASML |
|
| Installation/room/environment of EM systems |
Integrated reflection coefficient |
| Total, partial and integral cross-sections for inner-shell ionization |
SEM observation of structures underneath insulators |
| Intensity |
| Intensity of electron wave in specimen depth |
Kinematically diffracted electron and X-ray beams & their intensities |
| Intensity of transmitted electron beam in TEM |
Intensity of diffracted electron beam in TEM |
| Intensity distribution in the CBED disks |
Intensity distribution of HRTEM image |
| Intensity & amplitude of scattered wave by atoms |
Intensity comparison between elastic and inelastic scatterings |
| Diffractogram intensity spectra in TEM measurements |
Diffractogram intensity spectra of thin amorphous TEM specimen |
| EDS intensities and their ratio collected by detector |
Maximum intensity of plasmon energy loss peak |
| Diffraction intensity distribution in reciprocal lattices |
Intensity/counts of EELS |
| Intensity of bremsstrahlung X-rays: Kramers' law |
Intensity of characteristic X-rays |
| Beam intensities at two-beam diffraction condition |
Factors affecting contrast/intensity of elemental measurements (EELS & EDS) |
| Interaction |
| Interaction constant/parameter (between incident electrons and specimen) |
Energy loss function in interaction of incident electrons with materials |
| Interaction between incident charged particle (ion) and matter |
Interaction of X-ray with materials |
| Interaction between incident electrons and matters |
| Dynamical theory for energetic electron-matter interaction |
Incident electrons interacting with electrons in solids |
| Interaction between incident electron beam and atomic nuclei |
|
| Interaction volume |
| Interaction volumes for generation of secondary electrons |
Interaction volumes for generation of Auger electrons |
| Interaction volumes for generation of backscattered electrons |
Interaction volumes for generation of characteristic X-rays |
| “Effective” interaction volume for EELS measurements in TEM |
Interaction volumes for generation of continuum X-rays |
| Interaction volumes for generation of secondary fluorescence (X-rays) |
Effects of beam-specimen interaction volume on CBED |
| Interatomic spacing of materials |
| Analysis of interatomic spacing of amorphous materials using electron diffraction |
|
| Interband transition and measured by EELS |
| Interband transition strength |
Direct interband transition |
| Indirect interband transition |
Interband plasmon peak energy |
| Free-electron and interband transition metals |
|
| Interface |
| Difference of atomic structure between surface, interface, and bulk |
Interface between two crystals |
| Investigation and quantification of elemental segregation at interface |
TEM contrast/fringes at interface between two materials |
| Interfacial diffusion mechanism of electromigration in interconnects in ICs |
EELS profile at interface between two thin films |
| Interfacial defects in materials |
Interface analysis by TEM/STEM |
| ADF(HAADF)-STEM contrast at interfaces |
Stress/strain fields at interfaces |
| Resistive contact with resistive interface |
| Interfacial angles of cubic crystals |
|
| Interference |
| Plane wave and interference pattern in electron holography |
Coherence of electron beam/interference pattern in STEM/Ronchigram |
| Interference between direct and diffracted beams in TEM |
Interference width in off-axis hologram |
| Elements with possible X-ray interferences in EDS |
Film thickness determination by X-ray reflectivity/interference |
| Intergrowth compounds |
Interline transfer (IT) CCD |
| Intermediate/diffraction lens |
International/Hermann-Mauguin notations for symmetry elements |
| International technology roadmap for semiconductors |
International Union of Pure and Applied Chemistry (IUPAC) |
| Interplanar crystal spacing of the seven crystal families |
Internet & World Wide Web (website) for electron microscope and materials |
| Interpretation of EM data |
| Atomic number (Z)-contrast Imaging on STEM |
Poor TEM sample quality limiting data interpretation |
| Interpretation of TEM/STEM Images |
|
| Interstitial |
| Vacancy & interstitial generation in FIB milling |
Point defects (vacancy & interstitial) generated in Ar-milling |
| Inversion |
| Center of inversion (center of symmetry, i) |
Image helical rotation and inversion when changing magnification or focusing |
| Iodine/I2 |
| IBr |
ICl |
| Lead Iodide (PbI2) |
|
| Ion |
| High angle elastic scattering of ions |
Optics in electron and ion microscopes |
| Mechanical, electron and ion probe diameters |
EDS measurement of ion (Fe) |
| Electromigration transport mobility of ions in materials |
|
| Ion beams and their applications as detection tools |
| Focused ion beam (FIB) |
Scanning helium ion microscopy (SHIM or HeIM) |
| Secondary ion mass spectrometry (SIMS) |
FIB (ion beam) induced deposition (IBID) |
| Secondary electron emission by ion irradiation |
Ion sources for FIB |
| Ion beam induced structural change/damage at surfaces |
| Grain growth induced by FIB milling |
Chemical changes induced by ion beam irradiation |
| Throughput in E-beam Inspection |
|
| Intermetallic phase formation induced by ion beam irradiation |
"Mottling" visible in FIB and Ar-milled specimens |
| |
| Ion getter pumps |
Ionic migration induced by charging effect in SEM |
| Ion irradiation |
| Ion irradiation induced secondary electron emission |
Secondary electron emission from metal surfaces by ion irradiation |
| Ion irradiation dose |
High-energy-particle irradiation on materials |
| Ionic bonding-type materials |
| Comparison between ionic, covalent, and metallic materials |
Atomic & ionic radii and valence states of chemical elements
|
| Radius ratio rule |
|
| Ionic sputtering |
| Ionic sputtering yield in FIB |
Ionic sputter yield depending on grain orientation |
| Ion milling for TEM sample preparation |
Milling rate of materials in FIB |
| Ionization of atoms |
| Critical (ionization) energy/threshold (theory) |
Ionization cross sections and ionization energy/threshold (table) |
| Ionization cross section |
Mean ionization energy (potential) of complex materials |
| Radiation ionization energy to form electron-hole pairs in materials |
Ionization energy/dopant energy levels of impurities in Si |
| Momentum transfer of incident electrons after atomic ionization/energy loss |
Penning gauge/(cold cathode) ionization gauge |
| Ionization damage in EMs |
| Ionization damage (radiolysis) by incident electrons processes (mechanisms) |
Shape of ionization edge/core-loss edge in EELS |
| Most possible scattering angle of incident electrons after atomic ionization/energy loss |
|
| Ionization edge/core-loss edge in EELS profile |
| Shape of ionization edge/core-loss edge in EELS |
Fine structure of ionization edges in EELS |
| Ionization (collision) stopping power |
| Intermetallic phase formation induced by ion beam irradiation |
Interaction between incident electron beam and atomic nuclei |
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|
| Iron (Fe) |
| EDS/x-rays of iron (Fe) |
EELS measurement of iron (Fe) |
| C-doped Fe/carbon in iron |
| Ni-doped Fe/nickel in iron |
Steels |
| Iron (Fe) shroud in electromagnetic lenses |
TMO6 octahedral lattice |
| Fe-based metallic-glass alloys |
FePt alloys |
| Iso-chromatic imaging in EFTEM |
| Non-isochromaticity of energy filter |
|
| |
| Isoplanatic approximation |
Isotropic wet etch |
| Iterative wave function reconstruction for image series reconstruction with TEM |
|
