Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| Full width at half maximum (FWHM) of X-ray diffraction lines can be broadened in some cases, for instance, FWHM was greater than 1° because the existence of a non-homogeneous film composition gave a distribution in unit-cell parameters in TiSix [1].
[1] B. Chenevier, O. Chaix-Pluchery, I. Matko, R. Madar, F. La Via, Structural investigations of the C49–C54 transformation in TiSi2 thin films, Microelectronic Engineering 55 (2001) 115–122.
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