Large Uniform-thickness FIB-TEM Specimen Preparation
- Practical Electron Microscopy and Database -
- An Online Book -

http://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

=================================================================================

The FIB sputtering phenomenon is known as “V-shape”, and its exact shape depends on the competition between sputtering and redeposition for a given material. In order to obtain a large area with uniform thickness, V-shape should be compensated. Therefore, it is necessary to tilt both sides of the specimen into the Ga+ ion beam prior to the final polishing steps. For instance, a Zn specimen should be tilted ±14° into the ion beam.

 

 

=================================================================================

The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.