Streaking Artifacts in EELS Images and Profiles
- Practical Electron Microscopy and Database -
- An Online Book -

http://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

=================================================================================

In EELS measurements, an internal exposure shutter can cause a streak at an intense zero-loss peak in the spectra taken with a short exposure time. However, a beam deflector placed above the specimen can be used as an exposure shutter in order to avoid the streaking.

 

 

=================================================================================

The book author (Yougui Liao) welcomes your comments, suggestions, and corrections, please click here for submission. If you let book author know once you have cited this book, the brief information of your publication will appear on the “Times Cited” page.