Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| In EELS measurements, an internal exposure shutter can cause a streak at an intense zero-loss peak in the spectra taken with a short exposure time. However, a beam deflector placed above the specimen can be used as an exposure shutter in order to avoid the streaking.
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