Streaking Artifacts in EELS Images and Profiles
- Practical Electron Microscopy and Database -
- An Online Book -

https://www.globalsino.com/EM/  



 
This book (Practical Electron Microscopy and Database) is a reference for TEM and SEM students, operators, engineers, technicians, managers, and researchers.
 

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In EELS measurements, an internal exposure shutter can cause a streak at an intense zero-loss peak in the spectra taken with a short exposure time. However, a beam deflector placed above the specimen can be used as an exposure shutter in order to avoid the streaking.

 

 

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