Electron microscopy
  
XRD of Titanium Silicides
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Table 982. XRD of Titanium Silicides.

Titanium silicides XRD
TiSi2 XRD patterns of the 0.26 µm TiSi2 lines
XRD patterns of the 0.26 µm TiSi2 lines after the first RTA at 650 °C and the second RTA at 825 °C [1]. Only the C49(131) peak is observed after the first RTA. 
XRD patterns of the 0.26 µm TiSi2 lines
XRD patterns of the 0.26 µm TiSi2 lines after the first RTA at 650 °C and the second RTA at 825 °C [1]  

 

 

 

 

 

 

 

 

 

 

 

[1] Kaori Tai, Masao Okihara, Makiko Kageyama, Yusuke Harada, and Hiroshi Onoda, Effect of preamorphization implantation on C54–TiSi 2 formation in salicided narrow lines, Journal of Applied Physics, 85(6), 3132, 1999.









 

 

 
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