Chapter/Index: Introduction | A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | Appendix
| TEM images in Figure 0096 shows voids induced by sample preparation (see more details at ICsAndMaterials/page2352).
[1] Altamirano-Sánchez, E., Tao, Z., Gunay-Demirkol, A., Lorusso, G., Hopf, T., Everaert, J.-L., Clark, W., Constantoudis, V., Sobieski, D., Ou, F. S., & Hellin, D. (2016). Self-aligned quadruple patterning to meet requirements for fins with high density. SPIE Newsroom.
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